When manufacturing the insulating layer of a semiconductor chip (such as a silicon dioxide film), a commonly used chemical vapor deposition method is to use silane (SiH₄) and oxygen (O₂) as reactive gases. A gas mass flow controller (MFC) precisely controls the flow of silane and oxygen, ensuring they enter the reaction chamber in the exact ratio. This is critical to producing high-quality, uniform silica films. Because the thickness, composition and quality of the film directly affect the performance of semiconductor devices, such as insulation properties and electron migration characteristics.

During the PECVD process, precise proportioning of reaction gases, such as silane (SiH₄), ammonia (NH₃), etc., is required. The gas mass flow controller MFC can accurately measure and control the flow of these gases to ensure that the thickness, uniformity and photoelectric performance of the film reach ideal conditions, thereby improving the conversion efficiency and stability of photovoltaic cells.
PVD (Physical Vapor Deposition): During the PVD process, various reaction gases also need to be precisely controlled. The gas mass flow controller can stably provide the required gas flow according to process requirements, ensure the quality and performance of deposited films, and meet the production needs of photovoltaic cells.

During the evaporative coating process, methods such as resistance heating and electron beam heating are used to evaporate the coating material and then deposit it on the surface of the substrate. Gas mass flow controllers (MFCs) are used to precisely control the flow of process gases within vacuum chambers. For example, when plating aluminum films, argon is often introduced as a protective gas and auxiliary gas. MFC precisely controls the argon gas flow, which can prevent evaporated aluminum atoms from being oxidized during flight, ensuring the purity and quality of the aluminum film.

In the biological fermentation process, the growth and metabolism of microorganisms are very sensitive to the gas environment. The gas mass flow controller can accurately control the supply of gases such as oxygen, nitrogen and carbon dioxide to ensure the stability and consistency of the gas environment in the fermentation tank, thereby improving fermentation efficiency and product quality. For example, in antibiotic fermentation production, by precisely controlling oxygen flow, the dissolved oxygen level during the fermentation process can be maintained within a preset range and promote the synthesis of antibiotics.

Precisely control the supply of reactive gases: During fuel cell testing, the flow of reactive gases such as hydrogen and oxygen (or air) needs to be precisely controlled. The gas mass flow controller (MFC) can accurately deliver hydrogen to the anode of the fuel cell and oxygen or air to the cathode at a specific flow rate based on test requirements.

Oxygen supply: During aerobic fermentation, microorganisms need sufficient oxygen for respiration. Gas mass flow controllers (MFCs) precisely control the flow of oxygen into the fermenter. For example, in the process of yeast fermentation to produce ethanol, controlling the oxygen flow rate within an appropriate range through MFC can ensure the smooth progress of the aerobic respiration phase of the yeast and provide sufficient energy and intermediate products for the subsequent anaerobic fermentation to produce ethanol. . Generally speaking, MFC can control the oxygen flow rate from a few liters to dozens of liters per minute, depending on factors such as the size of the fermentor, the concentration of yeast, and the stage of fermentation.

Chemical reaction gas control: In some special elemental analysis methods, chemical reaction gases will be involved. For example, in a chemiluminescent nitrogen analyzer used to analyze the total nitrogen content in a sample, the flow of oxygen needs to be controlled through the MFC. Oxygen reacts with nitrogen compounds in the sample to produce a chemiluminescent signal. MFC's precise control of oxygen flow can adjust the rate and extent of the reaction, thereby accurately measuring the content of nitrogen. Generally speaking, MFC can control the oxygen flow rate at 50 - 150 mL/min to ensure that chemical reactions proceed under appropriate conditions.